An analytical effective channel-length modulation model for velocity overshoot in submicron MOSFETs based on energy-balance formulation

Khee Yong Lim and Xing Zhou


Microelectronics Reliability, Vol. 42, No. 12, pp. 1857-1864, December 2002.
(Manuscript received 6 April 2002; received in revised form 29 July 2002.)


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Abstract

A compact analytical model for MOSFET channel-length modulation (CLM) based on momentum and energy conservation of Boltzmann Transport Equation (BTE) as well as quasi-2D formulation is presented.  It is consistent with the generalized drift-diffusion (DD) formulation including the nonlocal electron temperature, which can be interpreted as being an effective CLM or effective velocity overshoot.  The model has a simple familiar form of the “pinch-off” model, with one fitting parameter for the length- and bias-dependent effective saturation field and effective Early voltage.  The model can be easily characterized with one measured Ids - Vds data and has been verified with submicron technology data for the full range of gate lengths and bias conditions.


References



Citation

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  2. [7] S. B. Chiah, X. Zhou, and K. Y. Lim, "Unified Length-/Width-Dependent Drain Current Model for Deep-Submicron MOSFETs," Proc. of the 6th International Conference on Modeling and Simulation of Microsystems (WCM-MSM2003), San Francisco, CA, Feb. 2003, vol. 2, pp. 342-345.
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  8. [11] C. Q. Wei, G. H. See, X. Zhou, and L. Chan, "A New Impact-Ionization Current Model Applicable to Both Bulk and SOI MOSFETs by Considering Self-Lattice-Heating," IEEE Trans. Electron Devices, Vol. 55, No. 9, pp. 2378-2385, September 2008.