E425: Engineering Design V
 
TCAD: Process and Device Simulation
 
X. ZHOU
© 1997
Step-28
Step-30

 
Step 29: Simulated Structure
 
Step-29
 
 
Step 29: P+ S/D photolithography: Mask: NWELL; Deposit positive photoresist; Masking; Exposure; Development.
 
Cross-Sectional View
Input Command
$step load_mask 
mask in.file=layout:0_0.tl1  
$step psd_mask 
deposit photo thick=1  
expose mask=NWELL  
develop