E425: Engineering Design V
TCAD: Process and Device Simulation
X. ZHOU
©
1997
Step 4: Simulated Structure
Step 4:
Oxide and photoresist etch
:
Etch SiO
2
; Strip all photoresist.
Cross-Sectional View
Input Command
$step etch_oxide
etch oxide
$step strip_photo
etch photo all