E425: Engineering Design V   TCAD: Process and Device Simulation  

X. ZHOU

© 1997

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  Step 3: Simulated Structure    
 
Step 3: N-well photolithography: Mask: NWELL; Deposit positive photoresist (+PR); Masking; Exposure; Development.
 

Cross-Sectional View	Input Command
	$step load_mask  mask in.file=layout:0_0.tl1   $step nwell_mask  deposit photo thick=1   expose mask=NWELL   develop