E425: Engineering Design V
TCAD: Process and Device Simulation
X. ZHOU
©
1997
Step 36: Simulated Structure
Step 36:
Metal photolithography
:
Mask: METAL; Deposit positive photoresist; Masking; Exposure; Development.
Cross-Sectional View
Input Command
$step load_mask
mask in.file=layout:0_0.tl1
$step metal_mask
deposit photo thick=1
expose mask=METAL
develop