E425: Engineering Design V   TCAD: Process and Device Simulation  

X. ZHOU

© 1997

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  Step 4: Simulated Structure    
 
Step 4: Oxide and photoresist etch: Etch SiO₂; Strip all photoresist.
 

Cross-Sectional View	Input Command
	$step etch_oxide  etch oxide   $step strip_photo  etch photo all