E425: Engineering Design V   TCAD: Process and Device Simulation  

X. ZHOU

© 1997

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  Step 14: Simulated Structure    
 
Step 14: Field implant: Implant B; Dose: 1.5x10¹³ cm^-2; Energy: 70 KeV.
 

Cross-Sectional View	Input Command
	$step field_implant  implant boron dose=1.5e13 energy=70