E425: Engineering Design V
 
TCAD: Process and Device Simulation
 
X. ZHOU
© 1997
Step-19
Step-21

 
Step 20: Simulated Structure
 
Step-20
 
 
Step 20: Sacrificial oxide etch: Etch SiO2: ~200 Å.
 
Cross-Sectional View
Input Command
$step etch_oxide 
etch oxide thicknes=0.022