E425: Engineering Design V   TCAD: Process and Device Simulation  

X. ZHOU

© 1997

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  Step 8: Simulated Structure    
 
Step 8:  Oxide etch: Strip all SiO₂.
 

Cross-Sectional View	Input Command
	$step strip_oxide  etch oxide all   $step extr_Npeak  select z=phosphorus   extract silicon val.extr x=14 maximum prefix="Pmax_wella " suffix=" cm**-3"  out.file=nwell:0_0.ext   $step extr_Nsurf  select z=phosphorus   extract silicon val.extr x=14 distance=0 prefix="Psur_wella " suffix=" cm**-3"  out.file=nwell:0_0.ext