E425: Engineering Design V   TCAD: Process and Device Simulation  

X. ZHOU

© 1997

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  Step 10: Simulated Structure    
 
Step 10: Nitride deposition: Deposit Si₃N₄: 1300 Å + dt_SiN .
 

Cross-Sectional View	Input Command
	$step deposit_nitride  deposit nitride thicknes=0.33