Technology computer-aided design (TCAD) has been used extensively by semiconductor companies to emulate wafer processing.  This project is directed towards the development and implementation of an integrated design of experiment (DOE) environment that emulates a given semiconductor process (such as the 0.25-µm CMOS process at CSM).  The objective is to develop such a system that can be used to predict results from process without time-consuming and expensive wafer processing.  Process parameters are to be tuned/calibrated to the real process.  Automated protocol for predicting process windows for certain particular process steps will be developed.  The students will gain real-life experience in this fast-growing industry.