E425: Engineering Design V   TCAD: Process and Device Simulation  

X. ZHOU

© 1997

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  Step 26: Simulated Structure    
 
Step 26: N+ S/D implant: Implant As; Dose: 5x10¹⁵ cm^-2; Energy: 130 KeV (Gaussian).
 

Cross-Sectional View

Input Command

$step N+ s/d_implant  implant arsenic dose=5e+15 energy=130 gaussian   $step extr_Npeak  select z=arsenic   extract silicon val.extr x=4 maximum prefix="Amax_nsdi " suffix=" cm**-3"  out.file=nsd_impl:0_0.ext   $step extr_Nsurf  select z=arsenic   extract silicon val.extr x=4 distance=0 prefix="Asur_nsdi " suffix=" cm**-3"  out.file=nsd_impl:0_0.ext   $step extr_xj_nsd  select z=doping   extract silicon d.extr x=4 value=0 prefix="xj_nsdi " suffix="(0.2) um"  out.file=nsd_impl:0_0.ext