E425: Engineering Design V   TCAD: Process and Device Simulation  

X. ZHOU

© 1997

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  Step 13: Simulated Structure    
 
Step 13: Field implant photolithography: Mask: NWELL; Deposit negative photoresist; Masking; Exposure; Development.
 

Cross-Sectional View	Input Command
	$step pfield_mask  deposit negative photo thick=1   expose mask=NWELL   develop