E425: Engineering Design V
TCAD: Process and Device Simulation
X. ZHOU
©
1997
Step 10: Simulated Structure
Step 10:
Nitride deposition
:
Deposit Si
3
N
4
: 1300 Å + dt
SiN
.
Cross-Sectional View
Input Command
$step deposit_nitride
deposit nitride thicknes=0.33