E425: Engineering Design V
 
TCAD: Process and Device Simulation
 
X. ZHOU
© 1997
Step-0
Step-2

 
Step 1: Simulated Structure
 
Step-1
 
 
Step 1: Starting wafer: <100>, B-doped, 10 W-cm.
 
Cross-Sectional View
Input Command
$step load_mask 
mask in.file=layout:0_0.tl1  
$step init_mesh 
method dy.oxide=0.1 err.fac=3  
mesh grid.fac=3 ly.surf=0.5 dy.surf=0.1 ly.activ=2 dy.activ=0.2 ly.bot=10 dy.bot=0.5 dx.min=0.2  
initialize <100> boron=10 resistiv  
$step save_struct 
savefile out.file=init_proc:0_0.tif tif