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A new "critical-current
at linear-threshold" method for direct extraction of deep-submicron MOSFET
effective channel length
- Zhou, X.; Lim, K.Y.; Lim, D.
Sch. of Electr. & Electron. Eng., Nanyang Technol. Inst., Singapore
This Paper Appears in :
Electron Devices, IEEE Transactions on
on Pages: 1492 - 1494
July 1999 |
Vol. 46 |
Issue: 7 |
ISSN: 0018-9383 |
References Cited: 12
CODEN: IETDAI
Accession Number: 6310782
Abstract:
A novel method for direct extraction of deep-submicron
MOSFET effective channel length is proposed, which requires only a single
measurement of the "critical-current at linear-threshold" ("I/sub crit/@V/sub
t0/") based on the maximum-g/sub m/ definition. With a simple calibration
of the channel sheet resistance from the long-channel I/sub crit/ data,
the effective channel length of any short-channel device on the same wafer
can be determined with one measurement of I/sub crit/@V/sub t0/. Meanwhile,
an averaged (modeled) effective channel length can be obtained from the
same data set with a simple algorithm, which can be used for device/circuit
modeling.
Subject Terms:
MOSFET; critical-current at linear-threshold;
deep-submicron MOSFET; MOSFET effective channel length; maximum-g/sub m/
definition; calibration; channel sheet resistance; short-channel device
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