Top-down and botton-up fabrication approach for nanophotonics

I-5: Top-down and botton-up fabrication approach for nanophotonics

Filippo Romanato TASC–INFM (Italy) and SME-NTU (Singapore)

Abstract

The talk will review recent research activity devoted to the fabrication of nano photonic devices. The generation of three dimensional pattern is a recent trend of nanotechnology oriented to minimize the steps of process necessary to fabricate complex structure or devices. On this road, we have developed several advanced fabrication methods based on the combination of different lithographic techniques that have been applied for the generation of complex three dimensional structures especially devoted to nano-photonics. The bottom-up approach is devoted to the synthesis a novel class of low-cost materials optimized with patter-ability, refraction index tunability, low absorption in the UV-VIS range and moreover functionalized with optical gain, e.g. by embedding light emitting nano particles (dye, rear earth, II-VI semiconductor compound nano-particles). Example of the both the approaches as well as their combination will be shown.