International Conference on Materials Processing

for Properties and Performance (MP3)

&

International Conference on Nanostructures and Nanotechnology*(N2)    

*    

24 26 November 2004

Orchard Parade Hotel

Singapore

 

 

 

INTERNATIONAL SCIENTIFIC COMMITTEE

 

 

C. Friend (Cranfield University, UK)

R. D James (University of Minnesota, USA)

Y. N Koval (Institute of Metal Physics, Ukraine)

K. M. Liew (Nanyang Technological University, Singapore)

V. Lindroos (Helsinki University of Technology, Finland)

S. Miyazaki (University of Tsukuba, Japan)

H. Sehitoglu (University of Illinois-UC, USA)

J. Van Humbeeck (Catholic University of Leuven, Belgium)

V. Lindroos (Helsinki U Techn, Finland)

L.C. Zhao (Harbin Institute of Technology, China)

D. Williams (Univ. of Liverpool, UK)

P. Marquis (University of Birmingham, UK)

B. Milthorpe (University of New South Wales, Australia)

G. Sundararajan (ARCI, India)

Y. Watanabe (National Defense Academy, Japan)

Y-B Cheng (Monash University, Australia)

C. Humphreys (Univ of Cambridge, UK)

L.M. Zhou (HK Polytechnic Univ., Hong Kong)

C. Jagadish (ANU, Australia)

M. Kushner  (UIUC, USA)

H. Sugai (Nagoya Univ. Japan)

D. J. Srolovitz  (Princeton Univ. )

M. Ford (UTS, Australia)

P. Mulvaney (Melbourne U, Australia)

M. S. Shur (Rensselaer Polytechnic Institute, USA)

C. Brechignac (universite Paris-Sud, France)

U. Landman (Georgia Tech. USA ),

Y.D. Zhen (Nanjing Univ. China), 

M. Chhowalla (Cambridge, UK), 

K.N. Tu (UCLA., USA), 

X.Q. Pan (Michigan Univ., USA) 

D. G. Schlom (Penn State University, USA)

G. Xiao (Brown U., USA)

R. Storer (Flinders, Australia)

A. Ekert (Cambridge, UK)

C.H. Diong  (Nanyang Technological University, Singapore)

L. Tan  (Nanyang Technological University, Singapore)

A. Wee  (National University of Singapore, Singapore)

G. Bauer (JKU, Linz, Austria)

J Kilner (Imperial College, UK)

R. Stevens (University of  Bath, UK)

C. Jagadish (University of Canberra, Australia)

P.P. Phule  (Univ. of Pittsburgh, USA)

J. Woodhead (Advanced Materials Resources, UK)

C. Bowen (University of Bath, UK)

G.Y.  Meng, (Anhui University, PRC)

L. Chan (Chartered Semiconductors, Singapore)

T. Andersson (Chalmers University of Technology, Sweden) 

E S W Kong (Nanophotonics Semiconductors, Singapore)
R Gotthardt
(EPFL, Switzerland)
V K Varadan (Penn State
U, USA)

P. D. Coates (University of Bradford, UK)

M.M. Dumoulin (Industrial Materials Institute, Canada)

E.Flender (Magma, GHmbH, Germany)

H. S. Fong (Nanyang Technological Univ, Singapore)

K. S. Hyun (Polymer Processing Institute, USA)

A.  Jarfors   (Institute for Metals Research, Sweden)

P. Kennedy (Moldflow Corporation, USA)        

F. Klein  (Fachhochschule Aalen, Germany)
K. Kondo  (University of Tokyo, Japan)
J. P. Qu   (South China Univ of Tech, P R China)
H. Wehr  (IKV, Aachen Technical Univ, Germany)
C. Y. Yue  (Nanyang Technological Univ, Singapore)